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21 January 2019 Innovating from History
Burn J. Lin
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Proceedings Volume 10584, Novel Patterning Technologies 2018; 1058402 (2019) https://doi.org/10.1117/12.2305526
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States
Abstract
The progression of projection printing systems is shown and discussed. We first showed the path of improvement of resolution and depth of focus through NA increase, wavelength and k1 reductions through resolution enhancement techniques. Lens imaging lens went through all-reflective, to dioptric, catadioptric, then back to all reflective systems. Systems of single optical axis moved to multiple optical axes, then single axis, and is coming back to multiple axes. Full-wafer field systems progressed to step-and-repeat systems, then stayed at step-and-scan. 1X systems gave way to reduction systems. Pellicleless systems improved to pellicle-essential systems and possibly back to pellicleless systems. We will pick the notable pacesetters in this long list of innovations to guide us into innovations in the future to sustain the growth of the industry. The lesson learned were applied to EUV lithography and nanoimprint lithography. Two non-resolution-centric systems are shown to show that there are other opportunities in lithography than just stubbornly pursuing Moore’s law of scaling.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
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Burn J. Lin "Innovating from History", Proc. SPIE 10584, Novel Patterning Technologies 2018, 1058402 (21 January 2019); https://doi.org/10.1117/12.2305526
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KEYWORDS
Photomasks
Semiconducting wafers
Extreme ultraviolet
Imaging systems
Lithography
Printing
Pellicles
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