Targeted removal of metallic contamination from lithography solvents using membrane purifiers

Aiwen Wu; Tetsu Kohyama; James Hamzik; Saksatha Ly; Jad Jaber

doi:10.1117/12.2297395

13 March 2018 Targeted removal of metallic contamination from lithography solvents using membrane purifiers

Aiwen Wu, Tetsu Kohyama, James Hamzik, Saksatha Ly, Jad Jaber

Proceedings Volume 10586, Advances in Patterning Materials and Processes XXXV; 1058618 (2018) https://doi.org/10.1117/12.2297395
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Metal ions in photoresists and solvents pose an ever greater contamination problem in photolithography’s advanced applications. The reduction of metal contaminants is critical in the entire photochemical supply chain. In this paper we demonstrate that two novel membrane purifiers dramatically reduced the metal contents in a range of organic solvents. These solvents are used for photoresist manufacturing and for wafer surface and dispense line rinse in track tools. The impact of flow rate and metal concentrations in the feed on the metal removal efficiency of the purifiers is presented. Furthermore, a study to determine the dominant mechanism of metal reduction in solvents is proposed.

Citation Download Citation

Aiwen Wu, Tetsu Kohyama, James Hamzik, Saksatha Ly, and Jad Jaber "Targeted removal of metallic contamination from lithography solvents using membrane purifiers", Proc. SPIE 10586, Advances in Patterning Materials and Processes XXXV, 1058618 (13 March 2018); https://doi.org/10.1117/12.2297395

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