Paper
5 June 2018 Improvement to the LIDT of high-reflection coatings by planarization of nodular defects
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Abstract
Planarization of nodular defects was investigated in order to improve the laser-induced damage threshold (LIDT) of high-reflection coatings. Monodisperse SiO2 microspheres were first deposited on the substrate surface by a spin coating process. Using a dual ion beam sputtering system, these engineered seeds were used to create artificial nodules in 1064nm HfO2/SiO2 high-reflection coatings and Ta2O5/SiO2 high-reflection coatings. These SiO2 microspheres were then smoothed by a single thick SiO2 planarization layer, where the relationship between the thickness of the planarization layer and the size of the microspheres was investigated. When the planarization layer (etching layer) thickness is slightly larger than the diameter of the seeds, the seeds could be completely planarized to obtain smooth thin films. In addition, the LIDT of the high-reflection coatings with different coating materials and different planarization layer thicknesses were tested. The results showed that the nodular defects planarization could noticeably improve the damage resistance of high- reflection coatings. In addition, the surface roughness of Ta2O5/SiO2 high-reflection coatings was shown to decrease after the planarization, while the surface roughness of the 1064nm HfO2/SiO2 high-reflection coatings was shown to increase.
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Lingyun Xie, Tao He, Jinlong Zhang, Hongfei Jiao, Bin Ma, Zhanshan Wang, and Xinbin Cheng "Improvement to the LIDT of high-reflection coatings by planarization of nodular defects", Proc. SPIE 10691, Advances in Optical Thin Films VI, 106911P (5 June 2018); https://doi.org/10.1117/12.2312418
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KEYWORDS
High reflection coatings

Coating

Etching

Multilayers

Ion beams

Scanning electron microscopy

Silica

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