Ultra-broadband perfect absorber based on successive nano-Cr-film

Hongfei Jiao; Xinshang Niu; Xuemin Zhang; Jinlong Zhang; Xinbin Cheng; Zhanshan Wang

doi:10.1117/12.2313133

5 June 2018 Ultra-broadband perfect absorber based on successive nano-Cr-film

Hongfei Jiao, Xinshang Niu, Xuemin Zhang, Jinlong Zhang, Xinbin Cheng, Zhanshan Wang

Proceedings Volume 10691, Advances in Optical Thin Films VI; 106911S (2018) https://doi.org/10.1117/12.2313133
Event: SPIE Optical Systems Design, 2018, Frankfurt, Germany

Abstract

We have designed and experimentally demonstrated a periodic multilayer structure of SiO₂ and Cr thin interlayers to achieve an ultra-broadband perfect absorber based on optical admittance matching method. The successive Nano-Cr-film make significant contribution to improving the absorption intensity of the structure. Measurements reveal high absorption over 85%, when averaged over the range 0.4–7.2 μm. Remarkably, it is the most broadband planar absorber film without involving lithography in fabrication. Incident angle and polarization dependence of the absorption spectra are also considered. The manufactured absorber also has potential applications for thermal shielding, detecting, imaging, photovoltaics (PVs), sensing, etc.

Citation Download Citation

Hongfei Jiao, Xinshang Niu, Xuemin Zhang, Jinlong Zhang, Xinbin Cheng, and Zhanshan Wang "Ultra-broadband perfect absorber based on successive nano-Cr-film", Proc. SPIE 10691, Advances in Optical Thin Films VI, 106911S (5 June 2018); https://doi.org/10.1117/12.2313133

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