Presentation
18 September 2018 Photochemistry of common spacecraft outgassing contaminants: a review (Conference Presentation)
Author Affiliations +
Abstract
Molecular contamination of optical surfaces, thermal control components, or other spacecraft components can lead to end-of-life performance degradation. In particular, exposure to vacuum ultraviolet (VUV) radiation is known to enhance contaminant deposition rates. Known mechanisms for photodeposition and photopolymerization of contaminants are here reviewed to provide insight into the underlying chemistry and reaction mechanisms. Previous works have shown that many variables influence the rate of contaminant uptake, including temperature, VUV energy, and material properties of both the contaminant molecules and the substrate. Additionally, the photochemistries of three common spacecraft outgassing contaminants (DOP, BPA, and DC 704) are discussed to provide insight into future modeling efforts.
Conference Presentation
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Abraham Buditama "Photochemistry of common spacecraft outgassing contaminants: a review (Conference Presentation)", Proc. SPIE 10748, Systems Contamination: Prediction, Control, and Performance 2018, 1074802 (18 September 2018); https://doi.org/10.1117/12.2322676
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KEYWORDS
Space operations

Photochemistry

Vacuum ultraviolet

Chemistry

Contamination

Control systems

Molecules

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