Paper
6 February 2019 Study of optic and laser-induced damage properties of Ta2O5 films deposited by different process parameters
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Abstract
The Ta2O5 thin film is one of the most important high refractive materials in the band range from visible to near infrared. In this paper, Ta2O5 thin films were prepared by electron beam thermal evaporation(EBE) technology with different process parameters. The optical performance parameters of Ta2O5 thin films with different process parameters were tested, and the process parameters of the minimum extinction coefficient and the highest laser-induced damage threshold of Ta2O5 thin films were obtained. The results show that when the optimum process parameters are: electron beam current 110 mA, pressure 2.0×10 -2 Pa, substrate temperature 150°C, the extinction coefficient of the prepared Ta2O5 thin film is the minimum; when the optimum process parameters are: pressure 1.0×10 -2 Pa, substrate temperature 150°C, The laser-induced damage threshold (LIDT) of the prepared Ta2O5 thin film is the highest when the electron beam current is 90 mA. The research results have reference significance for the selection of process parameters of Ta2O5 thin film with different the laser-induced damage thresholds.
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Houjun Li, Jun-qi Xu, Mian Li, Jian Wang, and Jun-hong Su "Study of optic and laser-induced damage properties of Ta2O5 films deposited by different process parameters", Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 1084216 (6 February 2019); https://doi.org/10.1117/12.2504780
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KEYWORDS
Thin films

Laser induced damage

Laser damage threshold

Mass attenuation coefficient

Electron beams

Protactinium

Refractive index

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