Scanning Electron Microscope Magnification Calibration for Metrology Applications

Murray Reeves; Glen Herriot

doi:10.1117/12.953078

19 July 1989 Scanning Electron Microscope Magnification Calibration for Metrology Applications

Murray Reeves, Glen Herriot

Proceedings Volume 1087, Integrated Circuit Metrology, Inspection, and Process Control III; (1989) https://doi.org/10.1117/12.953078
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

The magnification calibration method employed by the Nanolab series of instruments (U.S. patent application #117,741) uses a fast Fourier transform (FFT) of the line profile obtained from a calibration standard to accurately determine the system magnification. The standard used is a diffraction grating replica with certification traceable to the National Institute of Standards and Technology (NIST). The calibration routine is fast and simple, allowing the system to be easily recalibrated in less than 60 seconds. After calibration, the Nanolab maintains accurate magnification without the risk of errors associated with methods using compensation factors. This paper reviews factors affecting the accuracy and stability of electron optical measurement system calibration, and different approaches to system calibration. The Nanolab calibration procedure for critical dimension (CD) measurement is then described and the performance evaluated.

Citation Download Citation

Murray Reeves and Glen Herriot "Scanning Electron Microscope Magnification Calibration for Metrology Applications", Proc. SPIE 1087, Integrated Circuit Metrology, Inspection, and Process Control III, (19 July 1989); https://doi.org/10.1117/12.953078

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