A Simple And Calibratable Method For The Determination Of Optimal Focus

J. W. Gemmink

doi:10.1117/12.953149

25 July 1989 A Simple And Calibratable Method For The Determination Of Optimal Focus

J. W. Gemmink

Proceedings Volume 1088, Optical/Laser Microlithography II; (1989) https://doi.org/10.1117/12.953149
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

Achieving a proper focus setting in sub-micron optical lithography is extremely important. A technique has been developed for the determination of optimal focus setting on production lots. Using aerial image simulation the dimensions of the test structure studied have been optimized. With a simple optical microscope a judgement can be made about the focus setting. As the depth of focus becomes comparable to the resist thickness, it was observed that different methods of focus determination do not give the same results.

Citation Download Citation

J. W. Gemmink "A Simple And Calibratable Method For The Determination Of Optimal Focus", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); https://doi.org/10.1117/12.953149

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