Vibration Tolerance in Optical Imaging

B. J. Lin

doi:10.1117/12.953139

25 July 1989 Vibration Tolerance in Optical Imaging

B. J. Lin

Proceedings Volume 1088, Optical/Laser Microlithography II; (1989) https://doi.org/10.1117/12.953139
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

The effects of object-to-image vibration are studied with the purpose to quantitatively define the maximum acceptable vibration level as a function of resolution, linewidth control, exposure and focus tolerances, proximity condition, and illumination coherence. The exposure-defocus trees and windows of optically projected images are used to derive the vibration tolerance as well as the optimum exposure as a function of vibration amplitude. Dimensionless variables for resolution, focus and exposure are used so that the results are universally applicable for any given diffraction-limited lens system.

Citation Download Citation

B. J. Lin "Vibration Tolerance in Optical Imaging", Proc. SPIE 1088, Optical/Laser Microlithography II, (25 July 1989); https://doi.org/10.1117/12.953139

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