Nano-scale molecular analysis of photo-resist films with massive cluster secondary ion mass spectrometry

Michael J. Eller; Mingqi Li; Xisen Hou; Stanislav V. Verkhoturov; Emile A. Schweikert; Peter Trefonas

doi:10.1117/12.2515367

26 March 2019 Nano-scale molecular analysis of photo-resist films with massive cluster secondary ion mass spectrometry

Michael J. Eller, Mingqi Li, Xisen Hou, Stanislav V. Verkhoturov, Emile A. Schweikert, Peter Trefonas

Proceedings Volume 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII; 109590O (2019) https://doi.org/10.1117/12.2515367
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

Here we describe a methodology for molecular analysis at the nano-scale and present its capabilities. The analysis method is based on secondary ion mass spectrometry, SIMS, with gold nanoparticles (e.g. Au₄₀₀⁴⁺). The methodology presented here has unique features which enable molecular analysis at the nanoscale, namely the method of acquiring the mass spectrum and the nature of the impacting projectile. In the method a sequence of individual gold nanoparticles (Au₄₀₀⁴⁺) are used to bombard the sample, each impact results in ion emission from an area 10-20 nm in diameter. For each of impact of Au₄₀₀⁴⁺, the emitted ions are mass analyzed by time of flight mass spectrometry, detected and stored together in one mass spectrum prior to the arrival of the subsequent projectile. Each mass spectrum contains elementals, and molecules which were co-localized within 10-20 nm of one another. Examining the co-emitted ions allows to test the molecular homogeneity, and chemical composition at the nanoscale. We applied this method to a chemically amplified resist before and after exposure and development. After development the method was used to chemically characterize defect sites, which were not removed by the developing solution.

Conference Presentation

Citation Download Citation

Michael J. Eller, Mingqi Li, Xisen Hou, Stanislav V. Verkhoturov, Emile A. Schweikert, and Peter Trefonas "Nano-scale molecular analysis of photo-resist films with massive cluster secondary ion mass spectrometry", Proc. SPIE 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII, 109590O (26 March 2019); https://doi.org/10.1117/12.2515367

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