Bright high harmonic generation around 30 nm and 10 nm for seeding full coherent XFEL

Zhiyuan Lou; Yinghui Zheng; Luyao Zhang; Jiaqi Wu; Zhinan Zeng; Ruxin Li; Zhizhan Xu

doi:10.1117/12.2526238

21 June 2019 Bright high harmonic generation around 30 nm and 10 nm for seeding full coherent XFEL

Zhiyuan Lou, Yinghui Zheng, Luyao Zhang, Jiaqi Wu, Zhinan Zeng, Ruxin Li, Zhizhan Xu

Proceedings Volume 11056, Optical Measurement Systems for Industrial Inspection XI; 110562M (2019) https://doi.org/10.1117/12.2526238
Event: SPIE Optical Metrology, 2019, Munich, Germany

Abstract

We have generated soft X-ray pulses at the wavelength around 30 nm and 10 nm using high-order harmonic generation (HHG) in Ar and Ne gas targets respectively with low repetition rates, hundred-terawatt-level laser system in Shanghai Institute of Optics and Fine Mechanics (SIOM). The shortest wavelength of our generated harmonics is 9.8 nm at the 81th harmonic with the Ne gas target. Around the wavelength of 13 nm, the output energy of the 59th harmonic (13.5 nm) and the 61th harmonic (13.1 nm) reaches 10 nJ per pulse. This highly coherent extreme ultraviolet (XUV) source can be served as a potential seed for the free-electron laser (XFEL) with the method of laser wakefield acceleration (LWFA). Moreover, the 13 nm HHG source can be applied to coherent diffraction imaging (CDI) and XUV lithography.

Citation Download Citation

Zhiyuan Lou, Yinghui Zheng, Luyao Zhang, Jiaqi Wu, Zhinan Zeng, Ruxin Li, and Zhizhan Xu "Bright high harmonic generation around 30 nm and 10 nm for seeding full coherent XFEL", Proc. SPIE 11056, Optical Measurement Systems for Industrial Inspection XI, 110562M (21 June 2019); https://doi.org/10.1117/12.2526238

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