Stitching interferometry for synchrotron mirror metrology at NSLS-II (Conference Presentation)

Lei Huang; Tianyi Wang; Kashmira Tayabaly; Mourad Idir

doi:10.1117/12.2526502

9 September 2019 Stitching interferometry for synchrotron mirror metrology at NSLS-II (Conference Presentation)

Lei Huang, Tianyi Wang, Kashmira Tayabaly, Mourad Idir

Proceedings Volume 11109, Advances in Metrology for X-Ray and EUV Optics VIII; 111090R (2019) https://doi.org/10.1117/12.2526502
Event: SPIE Optical Engineering + Applications, 2019, San Diego, California, United States

Abstract

With the progressive development in synchrotron radiation facilities and free electron lasers (FELs), the requirement of the X-ray mirror is getting higher with tighter specifications. It challenges the X-ray mirror metrology in two major application scenes. On one hand, a reliable mirror measurement technique is needed to provide trustable feedback to the deterministic polishing in mirror fabrication or re-polishing process. On the other hand, it demands a more accurate mirror metrology technique to offer better services for the X-ray mirror inspection at synchrotrons and FELs to control the quality of X-ray mirrors to be installed into beamlines. Since the stitching interferometry can provide two-dimensional laterally extendable (stitched) results with sub-nanometer height resolution and precision, several stitching interferometric techniques are studied for synchrotron mirror metrology. It is not only to enhance the mirror inspection capability in NSLS-II optical metrology laboratory but also to act in concert with the ongoing ion beam figuring project at NSLS-II. Various stitching methods with different stitching parameters are investigated at our stitching interferometric platform. Some experimental results are revealed to demonstrate the validity and performance of the developed system and stitching methods.

Conference Presentation

Citation Download Citation

Lei Huang, Tianyi Wang, Kashmira Tayabaly, and Mourad Idir "Stitching interferometry for synchrotron mirror metrology at NSLS-II (Conference Presentation)", Proc. SPIE 11109, Advances in Metrology for X-Ray and EUV Optics VIII, 111090R (9 September 2019); https://doi.org/10.1117/12.2526502

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
PRESENTATION

WATCH
PRESENTATION SAVE TO MY LIBRARY

GET CITATION

KEYWORDS

Mirrors

Metrology

Synchrotrons

Stitching interferometry

X-rays

Free electron lasers

Inspection

Show All Keywords

Keywords/Phrases

Search In:

Publication Years