Design of a phase-shifting algorithm for interferometric measurement of optical thickness variation

Wonjun Bae; Yangjin Kim

doi:10.1117/12.2554163

2 March 2020 Design of a phase-shifting algorithm for interferometric measurement of optical thickness variation

Wonjun Bae, Yangjin Kim

Proceedings Volume 11287, Photonic Instrumentation Engineering VII; 112871I (2020) https://doi.org/10.1117/12.2554163
Event: SPIE OPTO, 2020, San Francisco, California, United States

Abstract

The optical thickness is an important property of transparent plates when fabricating critical components. Spatially nonuniform errors, which are major factors in the measurement of the absolute optical thickness, can be brought about by phase errors related to the nonlinear error term. In this study, equations and a new sampling window for suppressing spatially uniform errors were constructed. Using these equations and new sampling amplitudes, we designed a new phase-shifting algorithm with 17 samples. Herein, the characteristics and advantages to the measurement of highly reflective surfaces when applying this new 17-sample algorithm are presented based on a Fourier representation. In addition, the superiority of the new algorithm in terms of its error control is demonstrated by comparing the errors occurring from a varying object phase, as well as root mean square errors, with those from different conventional algorithms.

Citation Download Citation

Wonjun Bae and Yangjin Kim "Design of a phase-shifting algorithm for interferometric measurement of optical thickness variation", Proc. SPIE 11287, Photonic Instrumentation Engineering VII, 112871I (2 March 2020); https://doi.org/10.1117/12.2554163

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KEYWORDS

Phase shifts

Algorithm development

Error analysis

Interferometry

Fringe analysis

Optical testing

Reflectivity

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