EUV sensitization mechanisms of carboxylic acids used as ligands of metal oxide nanocluster resists (Conference Presentation)

Takahiro Kozawa; Yusa Muroya

doi:10.1117/12.2554989

24 March 2020 EUV sensitization mechanisms of carboxylic acids used as ligands of metal oxide nanocluster resists (Conference Presentation)

Takahiro Kozawa, Yusa Muroya

Author Affiliations +

Proceedings Volume 11323, Extreme Ultraviolet (EUV) Lithography XI; 113231B (2020) https://doi.org/10.1117/12.2554989
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

Recently, the metal oxide nanoclusters (or nanoparticles) have attracted much attention as a promising candidate for a resist material used for the high-volume manufacturing of semiconductor devices. The radiation-induced reactions of ligands play an important role in the sensitization of metal oxide nanocluster resists. In this study, the radiation-induced reactions of carboxylic acid ligands were investigated using a pulse radiolysis method. The results obtained in this study indicated that the molecular structures of ligands affect their reactivity to cationic and anion species and the stability of their radical cations and anions.

Conference Presentation

Citation Download Citation

Takahiro Kozawa and Yusa Muroya "EUV sensitization mechanisms of carboxylic acids used as ligands of metal oxide nanocluster resists (Conference Presentation)", Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 113231B (24 March 2020); https://doi.org/10.1117/12.2554989

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