Mathematical problems of holographic mask synthesis

M. Borisov; D. Chelubeev; V. Chernik; L. Merkushov; V. Rakhovskiy; A. Shamaev

doi:10.1117/12.2551942

23 March 2020 Mathematical problems of holographic mask synthesis

M. Borisov, D. Chelubeev, V. Chernik, L. Merkushov, V. Rakhovskiy, A. Shamaev

Proceedings Volume 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020; 113241I (2020) https://doi.org/10.1117/12.2551942
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

SWHL Nanotech team have implemented effective algorithms and developed scalable software allowing to synthesize holographic masks for various lithography applications including MEMS, MOEMS and high-end IC production. Most of the technical problems of state-of-art projection photolithography such as 3D-imaging, quality optimization were stated and solved as a completely numerical problems in the case of holographic lithography approach. Nanotech SWHL team developed effective algorithms of the holographic mask synthesis based on FFT with the complexity of 𝑂(𝑁 𝑙𝑛 𝑁), which allowed to synthesize holographic masks for any IC layer. We developed the continuous phase-shifting optimization method based on WFS, DFS and gradient descent, in which a hologram is synthesized not for the original pattern, but for a pattern with altered amplitude and phase distribution. Like in other RET, the holographic mask synthesized for the properly altered pattern provides a much better-quality image of the original pattern. Thus, today it is possible to use modern computing clusters for the synthesis of holographic masks and to implement them in inexpensive and sustainable devices for holographic photolithography.

Citation Download Citation

M. Borisov, D. Chelubeev, V. Chernik, L. Merkushov, V. Rakhovskiy, and A. Shamaev "Mathematical problems of holographic mask synthesis", Proc. SPIE 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, 113241I (23 March 2020); https://doi.org/10.1117/12.2551942

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
9 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Holography

Holograms

Image quality

Diffraction

Lithography

Algorithm development

Show All Keywords

Keywords/Phrases

Search In:

Publication Years