Antimony(V) carboxylate photoresists incorporating polymerizable olefins have demonstrated high photospeeds. The work of Passarelli et al. reported a sensitivity hypothesis, polymerizable olefin loading (POL), in which an increase in photospeed correlates to an increase in the number of olefins per molecular weight of resist.1 Utilizing this sensitivity trend, a photoresist of higher molecular weight, triphenylantimony(V) bis(4-vinylbenzoate) (JP-30), was developed exhibiting moderate photospeed at the cost of improved pattern fidelity.
Herein we report three approaches for improving the lithographic performance of polymerizable olefin antimony carboxylate photoresists. Approach 1 increased the number of olefins per molecule through functionalization of the R-group. Tristyreneantimony(V) dicarboxylate photoresists were lithographically evaluated exhibiting high photospeeds and improved resolution capabilities (Figure 1). Approach 2 examined the benefits of blending two antimony carboxylate photoresists with high and low POL values and observing the changes in photospeed. Approach 3 increased the POL relative to JP-30 through reduction in molecular weight of the R-groups by the synthesis and lithographic evaluation of trimethylantimony(V) bis(4-vinylbenzoate).
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