Achieving stitchless full chip curvilinear ILT in a day (Conference Presentation)

P. Jeffrey Ungar; Ali Bouaricha; Ryan Pearman; Linyong Pang; Aki Fujimura

doi:10.1117/12.2554808

25 March 2020 Achieving stitchless full chip curvilinear ILT in a day (Conference Presentation)

P. Jeffrey Ungar, Ali Bouaricha, Ryan Pearman, Linyong Pang, Aki Fujimura

Proceedings Volume 11327, Optical Microlithography XXXIII; 1132708 (2020) https://doi.org/10.1117/12.2554808
Event: SPIE Advanced Lithography, 2020, San Jose, California, United States

Abstract

Achieving stitchless full chip ILT in a day through a combination of mathematics and physics, high performance computing (HPC) methods, GPU acceleration, and tailoring our computational design platform (CDP) to the task is discussed.

Conference Presentation

Citation Download Citation

P. Jeffrey Ungar, Ali Bouaricha, Ryan Pearman, Linyong Pang, and Aki Fujimura "Achieving stitchless full chip curvilinear ILT in a day (Conference Presentation)", Proc. SPIE 11327, Optical Microlithography XXXIII, 1132708 (25 March 2020); https://doi.org/10.1117/12.2554808

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