Tailoring the ferroelectric properties of ZrO2 ultrathin films by interfacial engineering

Sheng-Han Yi; Jay Shieh; Miin-Jang Chen

doi:10.1117/12.2558448

15 May 2020 Tailoring the ferroelectric properties of ZrO₂ ultrathin films by interfacial engineering

Sheng-Han Yi, Jay Shieh, Miin-Jang Chen

Proceedings Volume 11377, Behavior and Mechanics of Multifunctional Materials IX; 113770C (2020) https://doi.org/10.1117/12.2558448
Event: SPIE Smart Structures + Nondestructive Evaluation, 2020, Online Only

Abstract

The ferroelectric and antiferroelectric properties of ZrO₂ ultrathin films (~12 nm in thickness) prepared by atomic layer deposition (ALD) were tailored by introducing sub-nanometer interfacial layers between the ZrO₂ ultrathin film and top and bottom Pt electrodes. In terms of polarization switching ability, the ferroelectricity of ZrO₂ ultrathin films was significantly enhanced by an HfO₂ interfacial layer (i.e., a Pt/HfO₂/ZrO₂/HfO₂/Pt layered arrangement). While, a TiO₂ interfacial layer (i.e., a Pt/TiO₂/ZrO₂/TiO₂/Pt layered arrangement) led to a transition from ferroelectricity to antiferroelectricity. The modulation of ferroelectricity and antiferroelectricity of ZrO₂ ultrathin films by the interfacial layers can be achieved without post-annealing.

Conference Presentation

Citation Download Citation

Sheng-Han Yi, Jay Shieh, and Miin-Jang Chen "Tailoring the ferroelectric properties of ZrO₂ ultrathin films by interfacial engineering", Proc. SPIE 11377, Behavior and Mechanics of Multifunctional Materials IX, 113770C (15 May 2020); https://doi.org/10.1117/12.2558448

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