Translating IC-centric photomask manufacturing to photonics-centric applications: Linking photomask processes to photonics waveguide performance

Kent H. Nakagawa; Nicholas Fahrenkopf

doi:10.1117/12.2572935

20 September 2020 Translating IC-centric photomask manufacturing to photonics-centric applications: Linking photomask processes to photonics waveguide performance

Kent H. Nakagawa, Nicholas Fahrenkopf

Author Affiliations +

Proceedings Volume 11518, Photomask Technology 2020; 115180S (2020) https://doi.org/10.1117/12.2572935
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only

Abstract

Silicon photonics is becoming a significant platform in high-bandwidth, low power device applications for HPC and cloud computing infrastructure. Its continuing push to displace incumbent copper and VCSEL technologies depends on the scaling potential of existing CMOS manufacturing processes. Central to this process is still the photomask, and its’ ability to accurately render design intent. However, processes and quality metrics that have been developed for electronics-centric photomasks do not translate directly to the needs of photonics-centric photomasks. This may lead to unconventional or non-intuitive choices for data rendering (fracture), mask pattern tooling (laser vs e-beam). Standard metrology (CD Uniformity, Localized LER) may not capture the essential elements that correlate mask pattern fidelity with waveguide signal loss. There are likely limits to a “blind translation” of IC-centric metrics to photonics-centric metrics. This paper will report on a collaborative effort to compare several photomask manufacturing approaches and their impact on photonics device performance (signal loss) for a common set of device structures. We will also explore the standard metrics applied to photomask quality and determine whether they correlate to waveguide performance, or whether different metrology approaches are required for vetting photonics-centric photomasks.

Conference Presentation

Citation Download Citation

Kent H. Nakagawa and Nicholas Fahrenkopf "Translating IC-centric photomask manufacturing to photonics-centric applications: Linking photomask processes to photonics waveguide performance", Proc. SPIE 11518, Photomask Technology 2020, 115180S (20 September 2020); https://doi.org/10.1117/12.2572935

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available