Modeling of emission spectrum of plasma EUV (13.5 nm) and shorter wavelength (≤7 nm) sources

Akira Sasaki

doi:10.1117/12.2584778

22 February 2021 Modeling of emission spectrum of plasma EUV (13.5 nm) and shorter wavelength (≤7 nm) sources

Akira Sasaki

Proceedings Volume 11609, Extreme Ultraviolet (EUV) Lithography XII; 116091T (2021) https://doi.org/10.1117/12.2584778
Event: SPIE Advanced Lithography, 2021, Online Only

Conference Poster

Abstract

We investigate atomic model of Sn and heavier elements for the numerical simulation of the EUV emission, which is useful for optimizing EUV sources. The emission of Sn at λ=13.5 nm mainly arises from 4-4 unresolved transition array (UTA) of around 10 times ionized ion. We developed an atomic model of Sn based on computational atomic data, taking the effect of configuration interaction (CI) into account. The opacity table based on the present atomic model was used to simulate the EUV emission using the radiation hydrodynamics code. Furthermore, we will show improvement of the atomic model including heavier elements. We use machine learning (ML) algorithms to infer unknown atomic data from existing data by identifying characteristic features of UTA.

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Akira Sasaki "Modeling of emission spectrum of plasma EUV (13.5 nm) and shorter wavelength (≤7 nm) sources", Proc. SPIE 11609, Extreme Ultraviolet (EUV) Lithography XII, 116091T (22 February 2021); https://doi.org/10.1117/12.2584778

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KEYWORDS

Plasma

Extreme ultraviolet

Tin

Ions

Data modeling

Lithography

Machine learning

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