PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
Directed self-assembly (DSA) of block copolymer thin films remains a promising alternative to achieve the resolution gains needed to enable dense patterning with sub-10 nm critical dimensions (CD). Yet, some significant challenges remain. Among others, two challenges stand out: one relating to the thermodynamic and kinetic conditions that lead to finite defect densities while the second relates to a scalability challenge to harness simultaneous gains in both resolution metrics: minimum line width and minimum pitch. Here we present a self-registered self-assembly process that employs a two-step DSA to address both the energetics of defect formation and the scalability limitations to achieve simultaneous gains in both pitch and line width when compared to the guiding patterns.
Lei Wan andRicardo Ruiz
"Self-registered self-assembly: a path to defect-free directed self-assembly with higher resolution gains", Proc. SPIE 11610, Novel Patterning Technologies 2021, 116100L (22 February 2021); https://doi.org/10.1117/12.2584668
ACCESS THE FULL ARTICLE
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.
The alert did not successfully save. Please try again later.
Lei Wan, Ricardo Ruiz, "Self-registered self-assembly: a path to defect-free directed self-assembly with higher resolution gains," Proc. SPIE 11610, Novel Patterning Technologies 2021, 116100L (22 February 2021); https://doi.org/10.1117/12.2584668