Fundamental research activities on EUV lithography at NewSUBARU synchrotron light facility

T. Watanabe; T. Harada; S. Yamakawa

doi:10.1117/12.2600896

23 August 2021 Fundamental research activities on EUV lithography at NewSUBARU synchrotron light facility

T. Watanabe, T. Harada, S. Yamakawa

Proceedings Volume 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology; 1190807 (2021) https://doi.org/10.1117/12.2600896
Event: Photomask Japan 2021, 2021, Online Only

Abstract

Since 2019, EUV lithography has started to be used for the mass production of 7-nm-node-logic devices. However, many significant issues on EUV lithography still remain in the fabrication of future devices. The technical issues are the development technologies of resist, mask, and EUV light source. Therefore, many significant fundamental researches have been carried out at our facility. Here the EUV mask technologies is highlighted. It is described the fundamental research activities on EUV lithography at NewSUBARU synchrotron light facility, which is related with EUV mask technologies.

Citation Download Citation

T. Watanabe, T. Harada, and S. Yamakawa "Fundamental research activities on EUV lithography at NewSUBARU synchrotron light facility", Proc. SPIE 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 1190807 (23 August 2021); https://doi.org/10.1117/12.2600896

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