Photorefractive waveguide grating switches for optical interconnects

Lewis B. Aronson; Lambertus Hesselink

doi:10.1117/12.17993

1 May 1990 Photorefractive waveguide grating switches for optical interconnects

Proceedings Volume 1212, Practical Holography IV; (1990) https://doi.org/10.1117/12.17993
Event: OE/LASE '90, 1990, Los Angeles, CA, United States

Abstract

A new optical switch design is reported consisting of two sets of parallel channel waveguides intersecting at right angles. Arrays based on Ti:LiNbO3 technology, with waveguide intersections iron doped to provide photorefractive sensitivity, have been fabricated. Interfering guided beams are used to write index gratings at the waveguide intersections, which in turn diffract a portion of an incident signal beam into the crossing waveguide. Arrays ranging from 15 x 15 up to 50 x 50 waveguides are constructed in an active area of 5 mm square. Diffraction efficiency and writing time measurements are reported along with a brief theoretical analysis. A proposal for a practical architecture offering nondestructive readout is described.

Citation Download Citation

Lewis B. Aronson and Lambertus Hesselink "Photorefractive waveguide grating switches for optical interconnects", Proc. SPIE 1212, Practical Holography IV, (1 May 1990); https://doi.org/10.1117/12.17993

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