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We fabricated nanoscale random anti-reflective surface structures on a prototype Reactive-Ion Plasma-Etched (RIPLE) grating. The prototype is a binary-profile, 1767 l/mm linear structure, over a 25x25 mm2 area on a ¼-inch thick Quartz plate, E-beam patterned, imbedded into the substrate by a Reactive-Ion Etching process. We achieved an 8:1 aspect ratio between the grating’s phase depth and space-width (187nm wide). The measured 1st-order unpolarized diffraction efficiency reaches 94.5%~96% and stays greater than 70% across a 200nm bandwidth centered at 560nm wavelength. The non-patterned side was populated with AR nanostructures. We detail the fabrication and evaluation of this complete prototype RIPLE grating.
Hanshin Lee,Uma Subash, andMenelaos K. Poutous
"Fabrication and evaluation of reactive ion-plasma etched astronomical diffraction grating with anti-reflective surface nanostructures", Proc. SPIE 12188, Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation V, 1218826 (29 August 2022); https://doi.org/10.1117/12.2627342
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Hanshin Lee, Uma Subash, Menelaos K. Poutous, "Fabrication and evaluation of reactive ion-plasma etched astronomical diffraction grating with anti-reflective surface nanostructures," Proc. SPIE 12188, Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation V, 1218826 (29 August 2022); https://doi.org/10.1117/12.2627342