Presentation + Paper
29 August 2022 Fabrication and evaluation of reactive ion-plasma etched astronomical diffraction grating with anti-reflective surface nanostructures
Author Affiliations +
Abstract
We fabricated nanoscale random anti-reflective surface structures on a prototype Reactive-Ion Plasma-Etched (RIPLE) grating. The prototype is a binary-profile, 1767 l/mm linear structure, over a 25x25 mm2 area on a ¼-inch thick Quartz plate, E-beam patterned, imbedded into the substrate by a Reactive-Ion Etching process. We achieved an 8:1 aspect ratio between the grating’s phase depth and space-width (187nm wide). The measured 1st-order unpolarized diffraction efficiency reaches 94.5%~96% and stays greater than 70% across a 200nm bandwidth centered at 560nm wavelength. The non-patterned side was populated with AR nanostructures. We detail the fabrication and evaluation of this complete prototype RIPLE grating.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hanshin Lee, Uma Subash, and Menelaos K. Poutous "Fabrication and evaluation of reactive ion-plasma etched astronomical diffraction grating with anti-reflective surface nanostructures", Proc. SPIE 12188, Advances in Optical and Mechanical Technologies for Telescopes and Instrumentation V, 1218826 (29 August 2022); https://doi.org/10.1117/12.2627342
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KEYWORDS
Diffraction gratings

Etching

Astronomy

Diffraction

Spectrographs

Plasma etching

Quartz

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