Spatially resolved dissolution monitoring using AFM

Luke Long; Jiajun Chen; Andrew Neureuther; Patrick Naulleau; Paul Ashby

doi:10.1117/12.2643273

1 December 2022 Spatially resolved dissolution monitoring using AFM

Luke Long, Jiajun Chen, Andrew Neureuther, Patrick Naulleau, Paul Ashby

Proceedings Volume 12292, International Conference on Extreme Ultraviolet Lithography 2022; 1229206 (2022) https://doi.org/10.1117/12.2643273
Event: SPIE Photomask Technology + EUV Lithography, 2022, Monterey, California, United States

Abstract

Continued lithographic scaling using high-NA EUV scanners requires materials and processes with sufficient resolution and stochastic performance to translate the aerial image into thin film photoresist material. Amongst these key processes is photoresist dissolution that converts latent exposure chemistry in the photoresist into a developed pattern. However, co-optimization of resist materials and the develop process is difficult due to the challenge of directly measuring resist dissolution at the nanometer spatial and sub-second temporal scales on which it occurs. Most metrology of the dissolution process thus ignores either the temporal component by measuring just the final developed structure, or the spatial component as is done in most dissolution rate monitoring experiments. To overcome these challenges, we have developed an in-situ dissolution rate monitoring technique using high-speed atomic force microscopy (AFM). As opposed to pioneering work using AFM to monitor the dissolution process, our technique incorporates the use of a specially-designed flow cell which provides precise control of the time at which developer is introduced to the photoresist material, as well as delivery of nearly full-strength developer in fractions of a second. Our system thus offers the ability to probe the spatially-dependent nature of the dissolution process at conditions close to those in the fab, providing insight into exposure-dependent dissolution rate gradient, material swelling, and other potentially lithographically relevant phenomena such as polymer entanglement. In doing so, we provide another technique to aid in the design and study of photoresist materials for future lithographic nodes.

Conference Presentation

Citation Download Citation

Luke Long, Jiajun Chen, Andrew Neureuther, Patrick Naulleau, and Paul Ashby "Spatially resolved dissolution monitoring using AFM", Proc. SPIE 12292, International Conference on Extreme Ultraviolet Lithography 2022, 1229206 (1 December 2022); https://doi.org/10.1117/12.2643273

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