Sub-100 nm feature sizes realized by cost-effective microscope projection photolithography

Lei Zheng; Carsten Reinhardt; Bernhard Roth

doi:10.1117/12.2648032

15 March 2023 Sub-100 nm feature sizes realized by cost-effective microscope projection photolithography

Lei Zheng, Carsten Reinhardt, Bernhard Roth

Proceedings Volume 12433, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI; 124330B (2023) https://doi.org/10.1117/12.2648032
Event: SPIE OPTO, 2023, San Francisco, California, United States

Abstract

The demand on the miniaturization of products has fostered the advancement of high-resolution fabrication technologies. Here, we demonstrate a simple and low-cost UV-LED-based lithography technique for structuring at micro- and nanoscale. The corresponding experimental setup was established with off-the-shelf components and allows for single structuring within seconds based on a standard microscope projection photolithography (MPP) process. By improving the printing quality of the structure pattern on transparent foil and employing aberration-corrected optical elements in the systems, high-quality waveguides and gratings at the micro- and nanoscale were successfully fabricated. Especially, minimum feature sizes down to 80 nm using a 100x microscope objective with NA of 1.4 were obtained. This operation-friendly, highly efficient and low-cost approach exhibits great potential in micro- and nanomanufacturing for applications in fields such as nanophotonics, integrated photonics, and micro- and nanoelectromechanical systems.

Conference Presentation

Citation Download Citation

Lei Zheng, Carsten Reinhardt, and Bernhard Roth "Sub-100 nm feature sizes realized by cost-effective microscope projection photolithography", Proc. SPIE 12433, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI, 124330B (15 March 2023); https://doi.org/10.1117/12.2648032

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