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A catadioptric design has been drawn to be used for semiconductor defect inspection in deep UV, which consists of nine lenses and mirrors. The numerical aperture was 0.8 and the whole length was 95 mm. The optical performances of the system were analyzed and the sensitivities of each component were investigated. Two lenses were found most sensitive and those lenses would be applied for the compensator when the system is going to be assembled. In this paper, the analysis results of the catadioptric system are presented, and the assembly plan is discussed.
(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Yunjong Kim,Young-Soo Kim,Dong-Kyun Kim, andHyun-il Cho
"Alignment strategy of an NA 0.8 Deep UV objective system for semiconductor defect inspection", Proc. SPIE 12669, Optomechanical Engineering 2023, 126690O (28 September 2023); https://doi.org/10.1117/12.2676602
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Yunjong Kim, Young-Soo Kim, Dong-Kyun Kim, Hyun-il Cho, "Alignment strategy of an NA 0.8 Deep UV objective system for semiconductor defect inspection," Proc. SPIE 12669, Optomechanical Engineering 2023, 126690O (28 September 2023); https://doi.org/10.1117/12.2676602