Open Access Paper
4 December 2023 Front Matter: Volume 12751
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 12751, including the Title Page, Copyright information, Table of Contents, and Conference Committee information.

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

Please use the following format to cite material from these proceedings:

Author(s), “Title of Paper,” in Photomask Technology 2023, edited by Ted Liang, Proc. of SPIE 12751, Seven-digit Article CID Number (DD/MM/YYYY); (DOI URL).

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510667501

ISBN: 9781510667518 (electronic)

Published by SPIE

P.O. Box 10, Bellingham, Washington 98227-0010 USA Telephone +1 360 676 3290 (Pacific Time)

SPIE.org

Copyright © 2023 Society of Photo-Optical Instrumentation Engineers (SPIE).

Copying of material in this book for internal or personal use, or for the internal or personal use of specific clients, beyond the fair use provisions granted by the U.S. Copyright Law is authorized by SPIE subject to payment of fees. To obtain permission to use and share articles in this volume, visit Copyright Clearance Center at copyright.com. Other copying for republication, resale, advertising or promotion, or any form of systematic or multiple reproduction of any material in this book is prohibited except with permission in writing from the publisher.

Printed in the United States of America by Curran Associates, Inc., under license from SPIE.

Publication of record for individual papers is online in the SPIE Digital Library.

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SPIEDigitalLibrary.org

Paper Numbering: A unique citation identifier (CID) number is assigned to each article in the Proceedings of SPIE at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

  • The first five digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01,02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1 Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Conference Committee

Conference Chair

  • Ted Liang, Intel Corporation (United States)

Conference Co-chair

  • Seong-Sue Kim, Seoul National University (Korea, Republic of)

Conference Program Committee

  • Frank E. Abboud, Intel Corporation (United States)

  • Uwe F.W. Behringer, UBC Microelectronics (Germany)

  • Ingo Bork, Siemens EDA (United States)

  • Brian Cha, Entegris, Inc. (United States)

  • Jin Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)

  • Aki Fujimura, D2S, Inc. (United States)

  • Emily E. Gallagher, imec (Belgium)

  • Arosha W. Goonesekera, Lasertec USA, Inc. (United States)

  • Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)

  • Henry H. Kamberian, Photronics, Inc. (United States)

  • Bryan S. Kasprowicz, HOYA Corporation (United States)

  • Byung Gook Kim, ESOL, Inc. (Korea, Republic of)

  • Romain Lallement, IBM Thomas J. Watson Research Center (United States)

  • Lawrence S. Melvin III, Synopsys, Inc. (United States)

  • Nihar Mohanty, Meta (United States)

  • Kent H. Nakagawa, Toppan Photomasks, Inc. (United States)

  • Dong-Seok Nam, ASML (United States)

  • Takahiro Onoue, HOYA Corporation (Japan)

  • Danping Peng, TSMC North America (United States)

  • Jed H. Rankin, IBM Corporation (United States)

  • Douglas J. Resnick, Canon Nanotechnologies, Inc. (United States)

  • Thomas Franz Karl Scheruebl, Carl Zeiss SMS Ltd. (Israel)

  • Ray Shi, KLA Corporation (United States)

  • JaeSik Son, SK Hynix System IC Inc. (Korea, Republic of)

  • Claire van Lare, ASML Netherlands B.V. (Netherlands)

  • Yongan Xu, Applied Materials, Inc. (United States)

  • Kei Yamamoto, FUJIFILM Corporation (Japan)

  • Seung-Hune Yang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)

  • Shusuke Yoshitake, NuFlare Technology, Inc. (Japan)

  • Larry S. Zurbrick, Keysight Technologies, Inc. (United States)

© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 12751", Proc. SPIE 12751, Photomask Technology 2023, 1275101 (4 December 2023); https://doi.org/10.1117/12.3021569
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KEYWORDS
Extreme ultraviolet lithography

Photomasks

Electron beam lithography

Imaging systems

Image processing

Nanoimprint lithography

Advanced patterning

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