Multi-beam mask writer MBM-3000 for next generation EUV mask production

Hiroshi Matsumoto; Jumpei Yasuda; Tomoo Motosugi; Hayato Kimura; Michihiro Kawaguchi; Yoshinori Kojima; Hiroshi Yamashita; Masato Saito; Takao Tamura; Noriaki Nakayamada

doi:10.1117/12.2687415

21 November 2023 Multi-beam mask writer MBM-3000 for next generation EUV mask production

Hiroshi Matsumoto, Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, Takao Tamura, Noriaki Nakayamada

Author Affiliations +

Proceedings Volume 12751, Photomask Technology 2023; 127510X (2023) https://doi.org/10.1117/12.2687415
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

The multi-beam mask writer MBM-3000 is launched in 2023 for next generation EUV mask production. It is equipped with 12-nm beamlets and a powerful cathode that brings out a beam current density of 3.6 A/cm², in order to achieve higher resolution and faster writing speed than our current writer MBM-2000PLUS. New optics with a next-generation blanking aperture array (BAA) is installed in order to double the beam count. The optics is designed to reduce the Coulomb interaction effects. It is equipped with aberration correctors to reduce image field distortion and other types of aberrations to obtain the best beam performance. Patterning resolution is improved by these measures. Writing tests confirmed that the MBM-3000, which uses a 1.5X larger beam current than the MBM-2000, simultaneously enhances both resolution and throughput.

Conference Presentation

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Hiroshi Matsumoto, Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, Takao Tamura, and Noriaki Nakayamada "Multi-beam mask writer MBM-3000 for next generation EUV mask production", Proc. SPIE 12751, Photomask Technology 2023, 127510X (21 November 2023); https://doi.org/10.1117/12.2687415

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