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We propose a deep photonic interferometer network architecture for designing fabrication-tolerant photonic devices. Our framework incorporates layers of variation-aware, custom-designed Mach-Zehnder interferometers and virtual wafer maps to optimize broadband power splitters under fabrication variations. Specifically, we demonstrate 50/50 splitters with below 1% deviation from the desired 50/50 ratio, even with up to 15 nm over-etch and under-etch variations. The significantly improved device performance under fabrication-induced changes demonstrates the effectiveness of the deep photonic network architecture in designing fabrication-tolerant photonic devices, and showcases the potential for improving circuit performance by optimizing for expected variations in waveguide width.
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
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Kazim Gorgulu, Aycan Deniz Vit, Ali Najjar Amiri, Emir Salih Magden, "Optimizing photonic devices under fabrication variations with deep photonic networks," Proc. SPIE 12891, Silicon Photonics XIX, 128910S (12 March 2024); https://doi.org/10.1117/12.3003058