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Conference CommitteeSymposium Chair Symposium Vice Chair Advisory Committee Chair Advisory Committee Members Naoya Hayashi, DNP, Honorary Fellow (Japan) Morihisa Hoga, NAMTEC Co., Ltd. (Japan) Toshiyuki Horiuchi, Tokyo Denki University (Japan) Hiroaki Morimoto (Japan) Masato Shibuya, Tokyo Polytechnic University (Japan) Kazuyuki Suko, Dai Nippon Printing Co., Ltd. (Japan) Yoshio Tanaka, D2S, Inc. (Japan) Nobuyuki Yoshioka, Dai Nippon Printing Co., Ltd. (Japan)
Organizing Committee Chair Organizing Committee Vice Chair Organizing Committee Members Uwe Behringer, UBC Microelectronics (Germany) Emily Gallagher, imec (Belgium) Brian Grenon, Grenon Consulting, Inc. (United States) Hideaki Hamada, HTL Co. Japan Ltd. (Japan) Masahiro Hashimoto, HOYA Corporation (Japan) Eiichi Hoshino, Nikon Corporation (Japan) Koji Ichimura, Dai Nippon Printing Co., Ltd. (Japan) Soichi Inoue, Kioxia Corporation (Japan) Kokoro Kato, Synopsys, Inc. (Japan) Yosuke Kojima, Toppan Photomask Co., Ltd. (Japan) Warren Montgomery, EMD Electronics (United States) Noriaki Nakayamada, NuFlare Technology, Inc. (Japan) Keita Shogase, SEMI Japan (Japan) Kiyohito Yamamoto, Canon Inc. (Japan)
Organizing Committee Auditors Fumio Aramaki, Hitachi High-Tech Corporation (Japan) Yoji Tonooka, Toppan Inc. (Japan)
Program Committee Chair Program Committee Vice Chairs Tetsuo Harada, University of Hyogo (Japan) Masaaki Koyama, Sony Semiconductor Manufacturing Corporation (Japan) Hiroshi Nakata, Dai Nippon Printing Co., Ltd. (Japan)
Program Committee Members Akihiko Ando, Kioxia Corporation (Japan) Jin Choi, Samsung Electronics Co., Ltd. (Korea, Republic of) Thomas Faure, GlobalFoundries Inc. (United States) Thiago Figueiro, Aselta Nanographics (France) Kenji Go, Mycronic Technologies Corporation (Japan) Terumasa Hirano, HOYA Corporation (Japan) Sanehiko Hoshi, D2S K.K. (Japan) Koji Ichimura, Dai Nippon Printing Co., Ltd. (Japan) Bryan Kasprowicz, HOYA Corporation (United States) Kokoro Kato, Synopsys, Inc. (Japan) Yusuke Kawano, Renesas Electronics Corporation (Japan) Byung-Gook Kim, ESOL, Inc. (Korea) Hiroyuki Miyashita, Dai Nippon Printing Co., Ltd. (Japan) Noriaki Nakayamada, NuFlare Technology, Inc. (Japan) Dong-Seok Nam, ASML US (United States) Yuhei Nitta, Nikon Corporation (Japan) Nobuhiro Okai, Hitachi, Ltd. (Japan) Thomas Scheruebl, Carl Zeiss SMT GmbH (Germany) Kazunori Seki, Toppan Photomask Co., Ltd. (Japan) Tsutomu Shoki, HOYA Corporation (Japan) Yasunari Sohda, University of Tsukuba (Japan) Yasuko Tabata, Tower Partners Semiconductor Co., Ltd. (Japan) Tetsuro Wakatsuki, JEOL Ltd. (Japan) Masami Yonekawa, Canon Inc. (Japan) Guojing Zhang, Intel Corporation (United States)
Steering Committee Chair Steering Committee Vice Chairs Soichi Inoue, Kioxia Corporation (Japan) Teruaki Noguchi, JEOL Ltd. (Japan)
Steering Committee Members Yumiko Amano, Renesas Electronics Corporation (Japan) Akihiko Ando, Kioxia Corporation (Japan) Hajime Aoyama, Nikon Corporation (Japan) Kenji Go, Mycronic Technologies Corporation (Japan) Tetsuo Harada, University of Hyogo (Japan) Koji Hosono, United Semiconductor Japan Co., Ltd. (Japan) Daisuke Kenmochi, HOYA Corporation (Japan) Yosuke Kojima, Toppan Photomask Co., Ltd. (Japan) Toshio Konishi, Toppan Photomask Co., Ltd. (Japan) Masaaki Koyama, Sony Semiconductor Manufacturing Corporation (Japan) Yasutaka Morikawa, Dai Nippon Printing Co., Ltd. (Japan) Hiroshi Nakata, Dai Nippon Printing Co., Ltd. (Japan) Yasuko Saito, ASML Japan Co., Ltd. (Japan) Kiwamu Takehisa, Lasertec Corporation (Japan) James Wiley, Wiley Strategic Solutions (United States)
Session Chairs 1 Opening Session: Day1 Yosuke Kojima, Toppan Photomask Co., Ltd. (Japan) 2 EUV Inspection & Repair Tetsuo Harada, University of Hyogo (Japan) 3 NIL1 Koji Ichimura, Dai Nippon Printing Co., Ltd. (Japan) 4 NIL2 Masami Yonekawa, Canon Inc. (Japan) 5 EUV Lithography & Source Tsutomu Shoki, HOYA Corporation (Japan) 6 Opening Session: Day2 Hiroshi Nakata, Dai Nippon Printing Co., Ltd. (Japan) 7 Mask Data Handling Kokoro Kato, Synopsys, Inc. (Japan) 8 Poster Session Yosuke Kojima, Toppan Photomask Co., Ltd. (Japan) 9 EUV Technologies Kazunori Seki, Toppan Photomask Co., Ltd. (Japan) 10 Opening Session: Day3 Akihiko Ando, Kioxia Corporation (Japan) 11 Patterning Technologies Yusuke Kawano, Renesas Electronics Corporation (Japan) 12 AI Utilization Kenji Go, Mycronic Technologies Corporation (Japan) 13 Writing Tools Noriaki Nakayamada, NuFlare Technology, Inc. (Japan)
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