Multilayer defect compensation based on three dimensional absorber correction in EUV lithography

Zheng Hang; Sikun Li; Dongchao Pang; Longqiao Zhang; Shuai Yuan; Xiangzhao Wang

doi:10.1117/12.3007995

24 November 2023 Multilayer defect compensation based on three dimensional absorber correction in EUV lithography

Zheng Hang, Sikun Li, Dongchao Pang, Longqiao Zhang, Shuai Yuan, Xiangzhao Wang

Proceedings Volume 12935, Fourteenth International Conference on Information Optics and Photonics (CIOP 2023); 129354E (2023) https://doi.org/10.1117/12.3007995
Event: Fourteenth International Conference on Information Optics and Photonics (CIOP 2023), 2023, Xi’an, China

Abstract

Multilayer defects cause severe reflectivity deformation and the degradation of through-focus imaging quality in Extreme ultraviolet (EUV) lithography. EUV mask repair techniques have primarily focused on the mask modification method to deal with the imaging contrast loss originating from multilayer defects. A multilayer defect compensation method based on three dimensional absorber correction considering through-focus imaging optimization and imaging contrast loss recovery is proposed in this paper. The proposed method compensates for the degradation of the imaging quality caused by multilayer defects with a certain defocus range by shifting the edge of the mask pattern and controlling the absorber thickness of the edge. The interactions between various absorber thicknesses and multilayer defect compensation are explored. Simulations verify that the through-focus imaging quality of the defective masks with bump defects could be obviously improved by the proposed method.

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Zheng Hang, Sikun Li, Dongchao Pang, Longqiao Zhang, Shuai Yuan, and Xiangzhao Wang "Multilayer defect compensation based on three dimensional absorber correction in EUV lithography", Proc. SPIE 12935, Fourteenth International Conference on Information Optics and Photonics (CIOP 2023), 129354E (24 November 2023); https://doi.org/10.1117/12.3007995

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
11 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Printing

3D mask effects

Extreme ultraviolet lithography

Multilayers

Extreme ultraviolet

Simulations

Deformation

Show All Keywords

Keywords/Phrases

Search In:

Publication Years