Modeling of polarization state change induced by off-axis reflective objectives for beam focusing in spectroscopic ellipsometry

Tae Dong Kang; Daewon Kwon; Inhee Joh; Myeongrok Oh; Mita Park; Hwanseong Moon; Seonmi Shin; Jooil Jang; Jinwon Park; Sangjun Park; Junje Seong; Ghilsoo Lee; Sungtae Kim

doi:10.1117/12.3025291

9 April 2024 Modeling of polarization state change induced by off-axis reflective objectives for beam focusing in spectroscopic ellipsometry

Tae Dong Kang, Daewon Kwon, Inhee Joh, Myeongrok Oh, Mita Park, Hwanseong Moon, Seonmi Shin, Jooil Jang, Jinwon Park, Sangjun Park, Junje Seong, Ghilsoo Lee, Sungtae Kim

Author Affiliations +

Proceedings Volume 12955, Metrology, Inspection, and Process Control XXXVIII; 129553W (2024) https://doi.org/10.1117/12.3025291
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

We configured a spectroscopic ellipsometer (SE) optical system with a micrometer spot size using reflective objectives. Two reflective objectives, based on the Schwarzchild configuration, are positioned just before and after the beam reflects on the sample. While we achieved the appropriate angle of incidence and numerical aperture (NA) of the light beam on the sample by utilizing an off-axis reflection configuration for the objectives, the polarization state of light is significantly influenced due to its asymmetric beam path, beam focusing, and reflection on the mirror surfaces. Therefore, we developed a proper model to describe the polarization state change arising from the effect of reflective objectives for our custom Spectroscopic Ellipsometer optical system and demonstrated its applicability for thin film structures.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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Tae Dong Kang, Daewon Kwon, Inhee Joh, Myeongrok Oh, Mita Park, Hwanseong Moon, Seonmi Shin, Jooil Jang, Jinwon Park, Sangjun Park, Junje Seong, Ghilsoo Lee, and Sungtae Kim "Modeling of polarization state change induced by off-axis reflective objectives for beam focusing in spectroscopic ellipsometry", Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 129553W (9 April 2024); https://doi.org/10.1117/12.3025291

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