Multi-beam mask writer MBM-3000 for next generation EUV mask production

Hiroshi Matsumoto; Jumpei Yasuda; Tomoo Motosugi; Hayato Kimura; Yoshinori Kojima; Hiroshi Yamashita; Masato Saito; Noriaki Nakayamada

doi:10.1117/12.3010686

9 April 2024 Multi-beam mask writer MBM-3000 for next generation EUV mask production

Hiroshi Matsumoto, Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, Noriaki Nakayamada

Author Affiliations +

Proceedings Volume 12956, Novel Patterning Technologies 2024; 1295602 (2024) https://doi.org/10.1117/12.3010686
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

The multi-beam mask writer MBM-3000 is launched in 2023 for next generation EUV mask production. It is equipped with 12-nm beamlets and a powerful cathode that brings out a beam current density of 3.6A/cm², in order to achieve higher resolution and faster writing speed than our current writer MBM-2000PLUS. New optics with a next-generation blanking aperture array (BAA) is installed in order to double the beam count. The optics is designed to reduce the Coulomb interaction effects. It is equipped with aberration correctors to reduce image field distortion and other types of aberrations to obtain the best beam performance. Data path is enhanced by the more computation resource and a new data format MBF2.1 which supports curve representation to process curvilinear pattern data efficiently. Writing tests confirmed that the MBM-3000, which uses a 1.5X larger beam current than the MBM-2000, simultaneously enhances both resolution and throughput.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Hiroshi Matsumoto, Jumpei Yasuda, Tomoo Motosugi, Hayato Kimura, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, and Noriaki Nakayamada "Multi-beam mask writer MBM-3000 for next generation EUV mask production", Proc. SPIE 12956, Novel Patterning Technologies 2024, 1295602 (9 April 2024); https://doi.org/10.1117/12.3010686

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