High-precision volume manufacturing of optical interference filters on 300mm wafers

Stephan Mingels; Martin Stapp; Torsten Schmauder; Navas Kutty; Harro Hagedorn

doi:10.1117/12.3017668

24 June 2024 High-precision volume manufacturing of optical interference filters on 300mm wafers

Stephan Mingels, Martin Stapp, Torsten Schmauder, Navas Kutty, Harro Hagedorn

Proceedings Volume 13020, Advances in Optical Thin Films VIII; 1302003 (2024) https://doi.org/10.1117/12.3017668
Event: SPIE Optical Systems Design, 2024, Strasbourg, France

Abstract

We have scaled up and improved an established Plasma Assisted Reactive Magnetron Sputtering (PARMS) system for high-precision volume manufacturing of complex optical filters. The system can process batches of substrates having a diameter of up to 300 mm. By means of rotatable targets for the sputter deposition, a planetary drive system for the substrate holders, and an optical monitoring system for in-situ process control, deposition of highly complex optical filters can be performed. A comparison of coating results from this machine and its predecessor for substrates with a diameter of up to 200 mm is shown. Due to the improvements, the layer non-uniformity of oxides could be reduced from ±0.5 % down to about ±0.15 % compared to the predecessor, even though the substrate diameter was increased. Using the optical monitoring system an optical band pass filter was deposited on Ø300 mm glass wafers demonstrating the capability of the machine for production with high throughput and yield.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Stephan Mingels, Martin Stapp, Torsten Schmauder, Navas Kutty, and Harro Hagedorn "High-precision volume manufacturing of optical interference filters on 300mm wafers", Proc. SPIE 13020, Advances in Optical Thin Films VIII, 1302003 (24 June 2024); https://doi.org/10.1117/12.3017668

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