Paper
1 February 2024 Research on Holographic performance under different exposure intensities
Linli Zhong, Yongkun Lin, Jing Xu, Chen He, Junchao Jin, Yuping Ke, Zeyi Zeng, Kun Wang, Dakui Lin, Xiao Lin, Xiaodi Tan
Author Affiliations +
Proceedings Volume 13067, International Workshop on Holography and Related Technologies (IWH2022 & 2023); 130670L (2024) https://doi.org/10.1117/12.3024819
Event: International Workshop on Holography and Related Technologies (IWH2022&2023), 2023, Fuzhou, China
Abstract
Exposure intensity affects the diffraction intensity and bit error rate of holographic materials. Now we design the experiment, unify the exposure amount, adjust the intensity of the information light and the recording time, and observe the bit error rate and diffraction intensity after the dark reaction for 1 minute. We verify that holograms with high intensity and short exposure time and dark reaction after 1 minute have lower bit error rate and higher diffraction intensity
© (2024) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Linli Zhong, Yongkun Lin, Jing Xu, Chen He, Junchao Jin, Yuping Ke, Zeyi Zeng, Kun Wang, Dakui Lin, Xiao Lin, and Xiaodi Tan "Research on Holographic performance under different exposure intensities", Proc. SPIE 13067, International Workshop on Holography and Related Technologies (IWH2022 & 2023), 130670L (1 February 2024); https://doi.org/10.1117/12.3024819
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KEYWORDS
Diffraction

Holography

Signal intensity

Data storage

Photonics

Design

Geometrical optics

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