Understanding molecular weight effects in polymer photoresists and how variations in molecular weight can affect dissolution rates

Amir Hegazy; Christian Francisco; Amanda Berryman; Gregory Denbeaux

doi:10.1117/12.3035361

12 November 2024 Understanding molecular weight effects in polymer photoresists and how variations in molecular weight can affect dissolution rates

Amir Hegazy, Christian Francisco, Amanda Berryman, Gregory Denbeaux

Author Affiliations +

Proceedings Volume 13215, International Conference on Extreme Ultraviolet Lithography 2024; 1321517 (2024) https://doi.org/10.1117/12.3035361
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Conference Poster

Abstract

Extreme ultraviolet (EUV) lithography, utilizing a 13.5nm wavelength, has significantly advanced the semiconductor industry. Key to this progress are developments in chemically amplified photoresists (CAR), though challenges like stochastic effects in photoresists complicate achieving required resolution and line edge roughness. To address these issues, the study explores polymethyl methacrylate (PMMA) as a model system, focusing on the impact of polymer molecular weight on roughness and defectivity. The paper investigates how variations in molecular weight influence the dissolution rate of PMMA in a developer, using commercial PMMA samples mixed with varying molecular weights to assess their dissolution behavior under EUV exposure.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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Amir Hegazy, Christian Francisco, Amanda Berryman, and Gregory Denbeaux "Understanding molecular weight effects in polymer photoresists and how variations in molecular weight can affect dissolution rates", Proc. SPIE 13215, International Conference on Extreme Ultraviolet Lithography 2024, 1321517 (12 November 2024); https://doi.org/10.1117/12.3035361

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