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A new system has been developed.for DC reactive magnetron sputtering. This system
features enhanced oxidation rates and near metallic sputtering conditions. It is particularly
well adapted for coating complex multilayer films and for depositing uniform thickness
films on small to moderate size planar and nonplanar substrates.
Richard Ian Seddon andPaul M. Lefebvre
"MetaMode: a new method for high-rate MetaMode reactive sputtering", Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990); https://doi.org/10.1117/12.22379
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Richard Ian Seddon, Paul M. Lefebvre, "MetaMode: a new method for high-rate MetaMode reactive sputtering," Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990); https://doi.org/10.1117/12.22379