Paper
1 November 1990 New optical design of exposure system: algorithm for designing irradiating lens and design of exposure system for use in liquid crystal display
Kenji Endo, Haruo Uemura, Shin-ichi Nagata, Masayoshi Kobayashi, Atsushi Abematsu
Author Affiliations +
Abstract
A new algorithm for designing an illuminator in a proximity exposure system is discussed. A relation between aberration of an irradiating lens and the irradiance distribution is studied and it is found that the lens has to satisfy the expression:h =f tan 0 to achieve uniform distribution. We designed a new-type illuminator with irradiating lens based on this expression and used a Fresnel lens as a collimator. This illuminator has high uniformity in the distribution within over an exposure area of 650mm x 650 mm. It has a collimation angle which is desirable fOr high resolution; and, experimentally, a resolution of 5 p.m line and space pattern was observed with a gap of 50 p.m.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kenji Endo, Haruo Uemura, Shin-ichi Nagata, Masayoshi Kobayashi, and Atsushi Abematsu "New optical design of exposure system: algorithm for designing irradiating lens and design of exposure system for use in liquid crystal display", Proc. SPIE 1333, Advanced Optical Manufacturing and Testing, (1 November 1990); https://doi.org/10.1117/12.22820
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Lens design

Fresnel lenses

Collimation

Optics manufacturing

Collimators

Diffraction

Mirrors

RELATED CONTENT

Investigation of the design space for low aspect ratio LED...
Proceedings of SPIE (December 18 2012)
Compact and stable dual-fiber-optic refracting collimator
Proceedings of SPIE (October 27 2003)
Reflecting collimator systems with no central obscuration
Proceedings of SPIE (April 15 1993)
Laser profile converted device
Proceedings of SPIE (September 20 2002)
Collimator design for extended sources
Proceedings of SPIE (August 20 2009)
Spiral optical designs for nonimaging applications
Proceedings of SPIE (September 21 2011)

Back to Top