Applications of optical emission spectroscopy in plasma manufacturing systems

George G. Gifford

doi:10.1117/12.48938

1 March 1991 Applications of optical emission spectroscopy in plasma manufacturing systems

George G. Gifford

Proceedings Volume 1392, Advanced Techniques for Integrated Circuit Processing; (1991) https://doi.org/10.1117/12.48938
Event: Processing Integration, 1990, Santa Clara, CA, United States

Abstract

Optical ernissn)n spectroscopy (OES) is an established laboratory diagnostic technique for plasma processes. By detecting light from the electronic transitions of atoms and molecules it is possible to identify and monitor the chemical species in a plasma. This technique has been extended to semiconductor manufacturing to determine the endpoint of plasma processes. The production of semiconductor devices relies heavily on plasma etching and deposition processes. Because OES is a fairly simple technique its use as a continuous tool and process hionitor has been investigated. Ultimately this technique could provide immediate feedback for automatic adjustment of individual process parameters. This embodiment has been referred to as adaptive process control.

Citation Download Citation

George G. Gifford "Applications of optical emission spectroscopy in plasma manufacturing systems", Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); https://doi.org/10.1117/12.48938

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