Deep-UV diagnostics using continuous tone photoresist

Joseph P. Kirk; Michael S. Hibbs

doi:10.1117/12.44817

1 July 1991 Deep-UV diagnostics using continuous tone photoresist

Joseph P. Kirk, Michael S. Hibbs

Proceedings Volume 1463, Optical/Laser Microlithography IV; (1991) https://doi.org/10.1117/12.44817
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

Lines with steep sidewalls formed in high contrast photoresist with low absorption tend to hide the character of the dose distribution that formed them. For highly absorbing resists, the depth removed during development is directly proportional to Log(dose) and therefore gives a continuous tone record of the exposure dose distribution. Many photoresists useful at 436 nm with low absorption coefficients become highly absorptive at 248 nm and no longer produce sharp profiles. This continuous record of the dose distribution is used to measure uniformity of dose within a field, stability of dose control from exposure to exposure, dose unit matching, and the recording of high resolution dose profiles. Application of continuous tone photoresist to deep-UV lithography tool diagnostics is presented along with a model describing performance.

Citation Download Citation

Joseph P. Kirk and Michael S. Hibbs "Deep-UV diagnostics using continuous tone photoresist", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44817

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available