IR reflectance spectroscopy and AES investigation of titanium ion-beam-doped silica

Vladimir I. Belostotsky; Vladimir F. Solinov

doi:10.1117/12.46038

1 August 1991 IR reflectance spectroscopy and AES investigation of titanium ion-beam-doped silica

Vladimir I. Belostotsky, Vladimir F. Solinov

Proceedings Volume 1513, Glasses for Optoelectronics II; (1991) https://doi.org/10.1117/12.46038
Event: ECO4 (The Hague '91), 1991, The Hague, Netherlands

Abstract

Ion implantation modifies only the surface layer, so the most informative of the material structures are IR reflectance spectroscopy and AES with ion etching which allow carrying out of direct analysis of elementary composition of an implanted layer. IRS and AES studies have been carried out to investigate Ti+ ion-beam doped silica.

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Vladimir I. Belostotsky and Vladimir F. Solinov "IR reflectance spectroscopy and AES investigation of titanium ion-beam-doped silica", Proc. SPIE 1513, Glasses for Optoelectronics II, (1 August 1991); https://doi.org/10.1117/12.46038

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