Sputtering of silicate glasses

Teruhiko Kai; Hiromichi Takebe; Kenji Morinaga

doi:10.1117/12.47272

1 November 1991 Sputtering of silicate glasses

Teruhiko Kai, Hiromichi Takebe, Kenji Morinaga

Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47272
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China

Abstract

Each of the amorphous films that consists of SiO₂, Al₂O₃, CaO-SiO₂, or CaO-Al₂O₃ system was prepared by rf-sputtering. Changes of film thickness, structure, composition, and transmittance in the visible region depending on the sputtering time were discussed. Especially, the chemical shifts of SiK(alpha) and AlK(alpha) were measured for study of structure and composition of the films by using a high resolution x-ray fluorescence spectrometer with double crystals.

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Teruhiko Kai, Hiromichi Takebe, and Kenji Morinaga "Sputtering of silicate glasses", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47272

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