Plasma imaging in the XUV wavelength range (175 A) using curved layered-synthetic-microstructure coated surfaces

Sean P. Regan; L. K. Huang; Michael Finkenthal; Henry W. Moos; Troy W. Barbee Jr.

doi:10.1117/12.51250

1 January 1992 Plasma imaging in the XUV wavelength range (175 Å) using curved layered-synthetic-microstructure coated surfaces

Sean P. Regan, L. K. Huang, Michael Finkenthal, Henry W. Moos, Troy W. Barbee Jr.

Author Affiliations +

Proceedings Volume 1546, Multilayer and Grazing Incidence X-Ray/EUV Optics; (1992) https://doi.org/10.1117/12.51250
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

A recently constructed calibration facility utilizing a Manson soft x-ray line source in the wavelength range of 8 - 114 angstroms and a Penning ionization discharge (PID) in the 100 - 350 angstroms range, has been used to map the reflectivity across a curved layered synthetic microstructure (LSM) coated surface. This calibrated mirror was also used to image the Al III emission ((lambda) equals 170 - 175 angstroms) from the PID.

Citation Download Citation

Sean P. Regan, L. K. Huang, Michael Finkenthal, Henry W. Moos, and Troy W. Barbee Jr. "Plasma imaging in the XUV wavelength range (175 Å) using curved layered-synthetic-microstructure coated surfaces", Proc. SPIE 1546, Multilayer and Grazing Incidence X-Ray/EUV Optics, (1 January 1992); https://doi.org/10.1117/12.51250

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