Paper
29 July 1992 Effect of fabrication techniques on photodiode performance under 1.06-um pulsed-laser irradiation
Austin L. Huang, Rodger M. Walser, Michael F. Becker
Author Affiliations +
Abstract
This research investigates the damage morphology and electrical performance of variously fabricated PIN photodiodes under single-pulse laser irradiation. Specially-ordered and industrial-standard photodiodes were irradiated with various fluences from a 10 ns Nd:YAG laser at 1064 nm. Morphological damage was defined as any residual surface damage observed at 200X magnification under a Normarski optical microscope. Electrical damage entailed any significant change in reverse bias current between the before and after laser-irradiated I-V curves. The electrical transient photocurrent was monitored and recorded for anomalous electrical response. It is presumed that the different fabrication processes will affect the electrical response of the photodiode. The photodiode sample sets differed from one another by the doping mechanism (ion implantation or planar diffusion), the crystallinity of the substrate prior to ion implantation (crystalline or amorphous), and the anneal or regrowth processing (furnace or rapid thermal anneal). All diodes were p+-n photodiodes produced by implanting boron into a high-resistivity, n-doped silicon substrate. The junction depth of all the diodes was between 0.5 and 1.2 micrometers .
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Austin L. Huang, Rodger M. Walser, and Michael F. Becker "Effect of fabrication techniques on photodiode performance under 1.06-um pulsed-laser irradiation", Proc. SPIE 1624, Laser-Induced Damage in Optical Materials: 1991, (29 July 1992); https://doi.org/10.1117/12.60097
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photodiodes

Fabrication

Crystals

Diodes

Ion implantation

Laser irradiation

Doping

Back to Top