Paper
29 July 1992 Microstructural control of thin film thermal conductivity
Lori J. Shaw-Klein, Stephen D. Jacobs, Stephen J. Burns, John C. Lambropoulos
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Abstract
Previous studies have investigated the possible effects of thin film thermal conductivity on laser damage thresholds and the phenomenon of anomalously low thermal conductivity values for materials in thin film form. Here we discuss the primary microstructural mechanisms for the high thermal resistance found in thin films. By studying a number of thin film systems, we found that many factors contribute to the reduction in conductivity, and that primary mechanisms for thermal resistance depend on film material and processing conditions. Rare earth-transition metal films were studied to illustrate the effect of columnar microstructure, ZrO2 to show the effects of varying crystal structure, YBa2Cu3O7-(delta ) to show the effects of crystal structure anisotropy and hillock growth, and AIN to show the effects of impurities, dimensional effects, and nanocrystalline microstructure.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lori J. Shaw-Klein, Stephen D. Jacobs, Stephen J. Burns, and John C. Lambropoulos "Microstructural control of thin film thermal conductivity", Proc. SPIE 1624, Laser-Induced Damage in Optical Materials: 1991, (29 July 1992); https://doi.org/10.1117/12.60105
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Cited by 2 scholarly publications.
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KEYWORDS
Thin films

Crystals

Resistance

Anisotropy

Copper

Laser damage threshold

Metals

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