Optical damage mechanisms in hafnia and silica thin films

Lloyd L. Chase; Alex V. Hamza; Howard W. Lee

doi:10.1117/12.60126

29 July 1992 Optical damage mechanisms in hafnia and silica thin films

Lloyd L. Chase, Alex V. Hamza, Howard W. Lee

Proceedings Volume 1624, Laser-Induced Damage in Optical Materials: 1991; (1992) https://doi.org/10.1117/12.60126
Event: Laser-Induced Damage in Optical Materials: 1991, 1991, Boulder, CO, United States

Abstract

Optical damage mechanisms for submicron thick, electron beam deposited HfO₂ and SiO₂ films on BK-7 substrates have been investigated by monitoring the emission of neutral constituents during excitation with time-delayed pairs of 70 ps laser pulses at a wavelength of 1064 nm. In silica, and probably also HfO₂, linear absorption is the mechanism for energy deposition into the films by the laser beams. Sporadic ablation observed for the HfO₂ films may be related to optical conditioning of multilayer HfO₂-SiO₂ high-reflector coatings.

Citation Download Citation

Lloyd L. Chase, Alex V. Hamza, and Howard W. Lee "Optical damage mechanisms in hafnia and silica thin films", Proc. SPIE 1624, Laser-Induced Damage in Optical Materials: 1991, (29 July 1992); https://doi.org/10.1117/12.60126

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