Photon absorption and the decay of surface excitation on sapphire (1120)-(3x1)

Alex V. Hamza; Robert S. Hughes Jr.; Lloyd L. Chase; Howard W. Lee

doi:10.1117/12.60127

29 July 1992 Photon absorption and the decay of surface excitation on sapphire (1120)-(3x1)

Alex V. Hamza, Robert S. Hughes Jr., Lloyd L. Chase, Howard W. Lee

Proceedings Volume 1624, Laser-Induced Damage in Optical Materials: 1991; (1992) https://doi.org/10.1117/12.60127
Event: Laser-Induced Damage in Optical Materials: 1991, 1991, Boulder, CO, United States

Abstract

A laser-based two-pulse correlation technique is used to investigate the mechanisms of photon absorption and the decay of surface excitation on Al₂O₃(1120). The mechanism for emission of positive or neutral particles depends on the wavelength and/or pulsewidth. In our previous study for a pulsewidth of 80 picoseconds at 1064 nm the lifetime of the surface excitation leading to detectable emission and further to optical surface damage was measured to be approximately 200 picoseconds. However, for 800 femtosecond pulses at 616 nm the measured lifetime is a few nanoseconds. In both cases a low-order absorption process is indicated.

Citation Download Citation

Alex V. Hamza, Robert S. Hughes Jr., Lloyd L. Chase, and Howard W. Lee "Photon absorption and the decay of surface excitation on sapphire (1120)-(3x1)", Proc. SPIE 1624, Laser-Induced Damage in Optical Materials: 1991, (29 July 1992); https://doi.org/10.1117/12.60127

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