Two-dimensional high-resolution stepper image monitor

Anton K. Pfau; Richard Hsu; William G. Oldham

doi:10.1117/12.130319

1 June 1992 Two-dimensional high-resolution stepper image monitor

Anton K. Pfau, Richard Hsu, William G. Oldham

Proceedings Volume 1674, Optical/Laser Microlithography V; (1992) https://doi.org/10.1117/12.130319
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

A two-dimensional image monitor with high resolution has been implemented on a deep-UV 0.6 NA stepper. The aerial intensity sensor uses a photodiode which is integrated in the wafer chuck and a chromium coated quartz wafer with an array of 0.2 (im pinholes. The aerial image is scanned by the sensor which is positioned by the stepper stage. The image monitor is suitable for stepper setup and a performance characterization. The two-dimensional measurement makes possible the detection of lens aberrations. The aberrations may be determined in type and magnitude by slicing the image at various focus levels. The image monitor has shown significant capability for experimental investigation of a great variety of issues for lithographic projection printers

Citation Download Citation

Anton K. Pfau, Richard Hsu, and William G. Oldham "Two-dimensional high-resolution stepper image monitor", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130319

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