Two-stage x-ray mirror system for microscopic x-ray photoelectron spectroscopy

Ken Ninomiya; Masaki Hasegawa; Sadao Aoki

doi:10.1117/12.132132

20 October 1992 Two-stage x-ray mirror system for microscopic x-ray photoelectron spectroscopy

Ken Ninomiya, Masaki Hasegawa, Sadao Aoki

Proceedings Volume 1720, Intl Symp on Optical Fabrication, Testing, and Surface Evaluation; (1992) https://doi.org/10.1117/12.132132
Event: International Symposium on Optical Fabrication, Testing, and Surface Evaluation, 1992, Tokyo, Japan

Abstract

An x-ray mirror system based on the off-axis configuration of Wolter-type mirrors is built up for microscopic x-ray photoelectron spectroscopy ((mu) -XPS), and its focusing characteristics are evaluated using the MgK(alpha) x rays (1253.6 eV). The focussed beam diameter is 15 - 20 micrometers when the 6 mm diameter x-ray source is used. This indicates that the mirror system has achieved the high demagnification of 1/300 - 1/400 required for (mu) - XPS analysis in the micrometer range. The future performance of (mu) -XPS analysis using a rotating-anode x-ray source is outlined.

Citation Download Citation

Ken Ninomiya, Masaki Hasegawa, and Sadao Aoki "Two-stage x-ray mirror system for microscopic x-ray photoelectron spectroscopy", Proc. SPIE 1720, Intl Symp on Optical Fabrication, Testing, and Surface Evaluation, (20 October 1992); https://doi.org/10.1117/12.132132

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